Work function measurements during growth of ultra thin films of SiO2 on characterized silicon surfaces

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Bibliographic Details
Published in:Solid-state electronics 1984-05, Vol.27 (5), p.413-417
Main Authors: RAISIN, C, VIEUJOT-TESTEMALE, E, BEN BRAHIM, A, PALAU, J. M, LASSABATERE, L
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Exact sciences and technology
Physics
Surface double layers, schottky barriers, and work functions
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ISSN:0038-1101
1879-2405
DOI:10.1016/0038-1101(84)90147-3