Evidence for formation of low resistance TiSi2 layer with Ti/NSi/Ti/native oxide/PSi (100) stack

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Bibliographic Details
Published in:Solid-state electronics 1989-05, Vol.32 (5), p.413-414
Main Authors: Singh, Awatar, Khokle, W.S., Jaiswal, R.K., Shah, S.A.A.
Format: Article
Language:English
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ISSN:0038-1101
DOI:10.1016/0038-1101(89)90132-9