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Furnace N2O oxidation process for submicron MOSFET device applications

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Bibliographic Details
Published in:Solid-state electronics 1993-05, Vol.36 (5), p.749-751
Main Authors: HYUNSANG HWANG, MING-YIN HAO, LEE, J, MATHEWS, V, FAZAN, P. C, DENNISON, C
Format: Article
Language:English
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ISSN:0038-1101
1879-2405
DOI:10.1016/0038-1101(93)90245-L