The photoelectric work function of monolayer films of uranium on polycrystalline tungsten

Films of uranium of up to a few monolayers in thickness were evaporated on to polycrystalline tungsten substrates at pressures not higher than 2 × 10 −10Torr. The photo-electric work function of the films as a function of coverage was determined using the Fowler technique: the work function at monol...

Full description

Saved in:
Bibliographic Details
Published in:Surface science 1967-01, Vol.8 (4), p.417-425
Main Authors: Lea, Colin, Mee, C.H.B.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Films of uranium of up to a few monolayers in thickness were evaporated on to polycrystalline tungsten substrates at pressures not higher than 2 × 10 −10Torr. The photo-electric work function of the films as a function of coverage was determined using the Fowler technique: the work function at monolayer coverage was found to be 3.65 ± 0.01 eV for a film at room temperature. Between about 940°K and 1040°K (i.e. in the temperature range in which β-uranium is stable) the work function was 3.59 ± 0.01 eV, and above 1060°K (above the β-γ phase transition) the work function was 3.45 ± 0.01 eV.
ISSN:0039-6028
1879-2758
DOI:10.1016/0039-6028(67)90048-9