In situ characterization of SiO2 etching with second harmonic generation and ellipsometry

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Bibliographic Details
Published in:Surface science 1996-05, Vol.352-354, p.612-616
Main Authors: Priem, A., van Hasselt, C.W., Devillers, M.A.C., Rasing, Th
Format: Article
Language:English
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ISSN:0039-6028
DOI:10.1016/0039-6028(95)01213-3