Electron trapping in thin SiO2 films due to avalanche currents

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Bibliographic Details
Published in:Thin solid films 1972-11, Vol.13 (1), p.5-9
Main Authors: Neugebauer, C.A., Burgess, J.F., Joynson, R.E., Mundy, J.L.
Format: Article
Language:English
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ISSN:0040-6090
DOI:10.1016/0040-6090(72)90145-9