Reactive etching mechanism of tungsten silicide in CF4-O2 plasma

Saved in:
Bibliographic Details
Published in:Thin solid films 1984-08, Vol.118 (2), p.149-154
Main Authors: Lee, Young H., Chen, Mao-Min, Ahn, Kie Y., Bright, Arthur A.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0040-6090
DOI:10.1016/0040-6090(84)90066-X