Atomic defects and stresses in r.f.-sputtered SiO2 thin films

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Bibliographic Details
Published in:Thin solid films 1986-09, Vol.143 (1), p.83-90
Main Authors: Shabalov, A.L., Feldman, M.S.
Format: Article
Language:English
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ISSN:0040-6090
DOI:10.1016/0040-6090(86)90149-5