Etching of In2O3:Sn and In2O3:Te thin films in dilute HCl and H3PO4

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Bibliographic Details
Published in:Thin solid films 1986-08, Vol.141 (2), p.L87-L89
Main Authors: RATCHEVA, T, NANOVA, M
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(86)90361-5