The effects of bond strain on the properties of plasma-deposited silicon oxide films

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Bibliographic Details
Published in:Thin solid films 1987-07, Vol.150 (2), p.L97-L99
Main Authors: Machonkin, M.A., Jansen, F.
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(87)90110-6