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An iterative and consistent method for the complex refraction index calculation of absorbent thin films
We propose a new, fast and simple method for the calculation of the complex refraction index n+ ik for absorbent thin films on transparent substrates. Given the film thickness and the wavelength of the radiation used, we make use of an iterative-consistent scheme where only the experimental values o...
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Published in: | Thin solid films 1989-09, Vol.176 (1), p.69-72 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We propose a new, fast and simple method for the calculation of the complex refraction index
n+
ik for absorbent thin films on transparent substrates. Given the film thickness and the wavelength of the radiation used, we make use of an iterative-consistent scheme where only the experimental values of the transmittance and reflectance at normal incidence are required. We compare our method with previous calculations, and then apply it for amorphous silicon thin film. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/0040-6090(89)90364-7 |