LiF films: Production and characterization

LiF films were produced by thermal evaporation onto amorphous substrates kept (during evaporation) at temperatures ranging from ambient up to 350°C. The evolution through two polycrystalline states was analysed by X-ray diffraction techniques, which also revealed that the LiF film lattice parameter...

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Bibliographic Details
Published in:Thin solid films 1991-02, Vol.196 (1), p.75-83
Main Authors: Montereali, Rosa Maria, Baldacchini, Giuseppe, Martelli, Stefano, Do Carmo, L.C.Scavarda
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physical properties of thin films, nonelectronic
Physics
Solid surfaces and solid-solid interfaces
Surface energy
thermodynamic properties
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:LiF films were produced by thermal evaporation onto amorphous substrates kept (during evaporation) at temperatures ranging from ambient up to 350°C. The evolution through two polycrystalline states was analysed by X-ray diffraction techniques, which also revealed that the LiF film lattice parameter is equal to that of LiF crystal. The refractive index of the produced films was measured by transmission optical interferometry. Talisurf-6 profilometer measurements on the film surface show sharp edges and very smooth surfaces, which reflect the substrate surfaces.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(91)90175-W