Material and electronic properties of boron-doped silicon films deposited from SiH4-BCl3-N2 mixtures in an industrial low pressure chemical vapour deposition furnace

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Bibliographic Details
Published in:Thin solid films 1991-09, Vol.204 (1), p.33-48
Main Authors: BIELLE-DASPET, D, SCHEID, E, AZZARO, C, DE MAUDUIT, B, PIERAGGI, B
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physical properties of thin films, nonelectronic
Physics
Solid surfaces and solid-solid interfaces
Surface energy
thermodynamic properties
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(91)90492-G