Preparation of cyanoacrylate Langmuir-Blodgett films and their ultraviolet and electron resist application

• Published in: Thin solid films 1992-04, Vol.210, p.477-479
• Main Authors: Matveeva, N.K., Bokov, Yu.S.
• Format: Article
• Language: English
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/0040-6090(92)90317-5

Monolayers and multilayers of polycyanoacrylate derivatives have been studied. Cyanoacrylates containing from two to ten carbon atoms in the hydrocarbon chain have been used (C2–C10 cyanoacrylates). Cyanoacrylates with more than 5 carbon atoms in the chain are shown to be stable at the air-water interface and can be transferred on to a solid substrate. LB films consisting of 10–100 monolayers have been formed from C6–C10 polycyanoacrylates. A novel negative type UV resist based on LB films has been produced from the heptylpolycyanoacrylate, which possesses a sensitivity of 0.5 J cm −2. A resolution of 0.3 μm was achieved using this resist. Plasma-resistant high resolution electron beam resists have also been obtained with a sensitivity of 5 × 10 −5 C cm −2 for C7 cyanoacrylate LB films and 2 × 10 −7 C cm −2 for a cyanoacrylate containing a non-saturated link in the ω-position of the hydrocarbon chain.