Cost-effective processing by atomic layer epitaxy

Atomic layer epitaxy (ALE) has been developed for more than 15 years. In spite of an increased research activity in recent years, ALE is still considered a new technology for the growth of thin films and layered crystalline structures. The ALE process is digital in its nature, as are often the expec...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 1993-03, Vol.225 (1), p.96-98
Main Author: Suntola, Tuomo
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Solid surfaces and solid-solid interfaces
Surface and interface dynamics and vibrations
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Atomic layer epitaxy (ALE) has been developed for more than 15 years. In spite of an increased research activity in recent years, ALE is still considered a new technology for the growth of thin films and layered crystalline structures. The ALE process is digital in its nature, as are often the expectations of the process. Process control on an atomic level creates an image of piling up perfect crystals from complete crystal faces. At the same time it often creates an image of an expensive and time-consuming way of producing materials. In this paper we review the major factors of the cost efficiency of the ALE process in different application types and for different materials, and make a cost comparison between ALE and some conventional techniques.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(93)90134-B