High resistivity Co and Ti silicide formation on silicon-on-insulator substrates

Saved in:
Bibliographic Details
Published in:Thin solid films 1994-12, Vol.253 (1-2), p.462-466
Main Authors: HSIA, S. L, MCGUIRE, G. E, TAN, T. Y, SMITH, P. L, LYNCH, W. T
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(94)90367-0