Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

Diamond films were deposited by pulse-modulated magnetoactive microwave plasma chemical vapour deposition. The dependence of the deposition rate on the modulation frequency showed a strong peak at 500 Hz. The deposition rate of the pulse-modulated plasma was several times larger than that of the con...

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Bibliographic Details
Published in:Thin solid films 1996-08, Vol.281, p.264-266
Main Authors: Hatta, Akimitsu, Suzuki, Hidetoshi, Kadota, Ken-ichi, Ito, Toshimichi, Hiraki, Akio
Format: Article
Language:English
Subjects:
Chemical vapour deposition
Diamond
Glow discharge optical spectroscopy
Plasma processing and deposition
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Summary:Diamond films were deposited by pulse-modulated magnetoactive microwave plasma chemical vapour deposition. The dependence of the deposition rate on the modulation frequency showed a strong peak at 500 Hz. The deposition rate of the pulse-modulated plasma was several times larger than that of the continuous plasma at the same microwave power. The time-averaged methyl radical (CH 3) density measured by infrared laser absorption spectroscopy was also enhanced by pulse modulation; however, the CH 3 density was not always proportional to the resulting deposition rate.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(96)08648-8