Ring and axial vapor sources for uniform deposits

Theoretical curves are given for the thickness of the deposit on a plane surface from a vapor source consisting of a fine round wire shaped into a circular ring of radius R. The curves cover circular substrate areas having radii up to 1.4 R and source-to-substrate distances of 0.5 R to 3.2 R. They y...

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Bibliographic Details
Published in:Vacuum 1963, Vol.13 (2), p.53-55
Main Authors: Oberg, P.E., Sanders, R.M., Torok, E.J.
Format: Article
Language:English
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Summary:Theoretical curves are given for the thickness of the deposit on a plane surface from a vapor source consisting of a fine round wire shaped into a circular ring of radius R. The curves cover circular substrate areas having radii up to 1.4 R and source-to-substrate distances of 0.5 R to 3.2 R. They yield optimum source-to-substrate distances of 0.8 R and 1.0 R for deposits over circular areas of radii 1.0 R and 0.5 R, respectively. Theoretical loading distributions of an axial vapor source to produce a uniform deposit on a cylindrical substrate are given for various cylinder length-to-radius ratios. Distributions are expressed as even power series in the distance from the wire mid-point. Coefficients giving ±0.1 per cent thickness uniformity in the deposit are tabulated.
ISSN:0042-207X
1879-2715
DOI:10.1016/0042-207X(63)92432-1