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Local dependence of electron lifetime in amorphous Si devices with pin-structure
On the basis of the delayed collection field experiment, a new evaluation method is presented which allows the determination of the electron lifetime τ as a function of the local position x through the i-layer. The theory indicates that in principle the lifetime τ(x) and the built-in field F i (x) c...
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Published in: | Solar energy materials 1991-12, Vol.23 (2), p.282-288 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | On the basis of the delayed collection field experiment, a new evaluation method is presented which allows the determination of the electron lifetime τ as a function of the local position
x through the i-layer. The theory indicates that in principle the lifetime
τ(x) and the built-in field
F
i
(x)
can be determined separately. First measurements show that the carrier lifetime is significantly reduced at the p/i interface (
τ
i
= 10
ns
). The region of low τ expands less than 400 nm into the i-layer. The value of the bulk lifetime (
τ
b
= 0.9 μ
s
) confirms previous results. In the degraded state, the region of low lifetime is expanded deeper into the i-layer (∼ 900 nm). |
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ISSN: | 0165-1633 |
DOI: | 10.1016/0165-1633(91)90131-4 |