The effect of oxygen partial pressure on the properties of RF-sputtered Al2O3 thin films

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Bibliographic Details
Published in:Materials letters 1984-02, Vol.2 (3), p.196-201
Main Authors: CHEN, G. L, SIVERTEN, J. M, JUDY, J. H
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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ISSN:0167-577X
1873-4979
DOI:10.1016/0167-577X(84)90023-5