A study of catalytically transformed negative X-ray resists, based on aqueous base developable resin, an acid generator and a crosslinker

Negative working X-ray resists, based on phenolic resin, an acid generator and a crosslinker are described. First the sensitivities of various activators are compared by using a proton scavenger, that produces a colour upon protonation. Although diphenyliodonium hexafluorophosphate and chlorinated t...

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Bibliographic Details
Published in:Microelectronic engineering 1987-12, Vol.6 (1), p.467-471
Main Authors: Bruns, A., Luethje, H., Vollenbroek, F.A., Spiertz, E.J.
Format: Article
Language:English
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Summary:Negative working X-ray resists, based on phenolic resin, an acid generator and a crosslinker are described. First the sensitivities of various activators are compared by using a proton scavenger, that produces a colour upon protonation. Although diphenyliodonium hexafluorophosphate and chlorinated triazine derivatives appear to be the most sensitive ones, the difference with naphthoquinone diazides and CBr4 is not very pronounced. Subsequently it is shown that those activators that produce strong acids can induce acid catalyzed condensation reactions in resist films that consist of a phenolic resin and polyfunctional alkylating agents. As only very small amounts of acid are needed to render the phenolic resin insoluble in aqueous base developer, a very high sensitivity can be reached. Preliminary results with some experimental resists show a sensitivity of 20 mJ/cm2.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(87)90075-X