Measurement of the effective wavelength of x-ray lithography sources

This paper describes techniques to determine the effective wavelength of x-ray lithography sources. The experimental results give information on the actual x-ray absorption of the resist materials for the x-ray source under test. Results for two beam lines of the HELIOS storage ring installed at the...

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Bibliographic Details
Published in:Microelectronic engineering 1993-04, Vol.21 (1), p.113-116
Main Authors: Maldonado, Juan R., Babich, Inna, Hsia, L.C., Rippstein, R., Flamholz, A., DiMilia, Vincent
Format: Article
Language:English
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Summary:This paper describes techniques to determine the effective wavelength of x-ray lithography sources. The experimental results give information on the actual x-ray absorption of the resist materials for the x-ray source under test. Results for two beam lines of the HELIOS storage ring installed at the IBM Advanced Lithography Facility, and for one beam line at the VUV ring at the Brookhaven National Laboratory are presented, and compared to calculations.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(93)90039-8