Microlens lithography: A new approach for large display fabrication

Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming a...

Full description

Saved in:
Bibliographic Details
Published in:Microelectronic engineering 1996-01, Vol.30 (1-4), p.107-110
Main Authors: Völkel, R., Herzig, H.P., Nussbaum, Ph, Singer, W., Dändliker, R., Hugle, W.B.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the image plane. Potential applications for microlens lithography are the fabrication of large area flat panel displays (FPD), color filters, and micromechanics.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(95)00205-7