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Iodine-doping effects on the hetero-epitaxial growth of ZnS on GaP substrate using VPE method
Growth behavior and characterizations of hetero-epitaxially grown ZnS on GaP(100) substrates are given. Epitaxial growth was undertaken by the VPE method with iodine doping. A remarkable increase in the growth rate of ZnS layers together with a marked lowering of growth temperature, by about 200°C,...
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Published in: | Applied surface science 1988-09, Vol.33, p.654-660 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Growth behavior and characterizations of hetero-epitaxially grown ZnS on GaP(100) substrates are given. Epitaxial growth was undertaken by the VPE method with iodine doping. A remarkable increase in the growth rate of ZnS layers together with a marked lowering of growth temperature, by about 200°C, at the maximum growth rate were found to result from the addition of iodine gas to the reactant species. Considerable improvements of surface morphology and the crystallinity were also observed as a result of the iodine doping. Moreover, the coherent growth of ZnS layers on GaP(100) substrates was strongly indicated from the X-ray analyses data. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/0169-4332(88)90365-0 |