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The growth of ultra-thin amorphous WGex films on Si by the GeH4 reduction of WF6
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Published in: | Applied surface science 1991-11, Vol.53, p.47-53 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/0169-4332(91)90241-B |