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The growth of ultra-thin amorphous WGex films on Si by the GeH4 reduction of WF6

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Bibliographic Details
Published in:Applied surface science 1991-11, Vol.53, p.47-53
Main Authors: LEUSINK, G. J, OOSTERLAKEN, T. G. M, VAN DER JEUGD, C. A, JANSSEN, G. C. A. M, RADELAAR, S
Format: Article
Language:English
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ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(91)90241-B