Growth of epitaxial CoSi2 on Si(100) using Si(100)/Ti/Co bilayers

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Bibliographic Details
Published in:Applied surface science 1993-11, Vol.73, p.117-123
Main Authors: VANTOMME, A, NICOLET, M.-A, GANG BAI, FRASER, D. B
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Diffusion
interface formation
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Solid phase epitaxy
growth from solid phases
Solid surfaces and solid-solid interfaces
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(93)90154-4