Atomic hydrogen cleaning of a TiN surface

Atomic deuterium has been used to remove hydrocarbons and carbide species from a polycrystalline, partially oxidized TiN surface. The atomic deuterium was produced by flowing D 2 over a heated tungsten filament (2200 K). XPS studies indicate that the removal of hydrocarbons occurs readily while that...

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Bibliographic Details
Published in:Applied surface science 1994, Vol.74 (1), p.115-120
Main Authors: Prasad, Jagdish, Nuesca, Guillermo M., Kelber, Jeffry A.
Format: Article
Language:English
Subjects:
Composition
defects and impurities
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Physics
Solid surfaces and solid-solid interfaces
Surface treatments
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:Atomic deuterium has been used to remove hydrocarbons and carbide species from a polycrystalline, partially oxidized TiN surface. The atomic deuterium was produced by flowing D 2 over a heated tungsten filament (2200 K). XPS studies indicate that the removal of hydrocarbons occurs readily while that of carbides occurs at a slower rate. No significant effects were observed for O and N. Some reduction of TiN to a metallic state is observed. These results indicate that atomic hydrogen can be used for removing contamination from TiN substrates without affecting the integrity of the substrate.
ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(94)90106-6