Influence of mixed reductants on the growth rate of WF6-based W-CVD

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Bibliographic Details
Published in:Applied surface science 1995-10, Vol.91 (1-4), p.162-168
Main Authors: JONGSTE, J. F, OOSTERLAKEN, T. G. M, LEUSINK, G. J, VAN DER JEUGD, C. A, JANSSEN, G. C. A. M, RADELAAR, S
Format: Article
Language:English
Subjects:
Applied sciences
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Metals. Metallurgy
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(95)00113-1