Thin film growth by the pulsed laser assisted deposition technique

Pulsed laser-assisted deposition (PLD) has recently emerged as a most promising film growth technique, at least for basic research, as this has been best demonstrated for highTc superconducting oxides and YBa2Cu3O7−x in particular. This article briefly outlines the specific features of this techniqu...

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Bibliographic Details
Published in:Applied surface science 1996-04, Vol.96-98, p.630-642
Main Author: Belouet, C.
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science
rheology
Cuprates superconductors (high tc and insulating parent compounds)
Exact sciences and technology
Growth
High-Tc compounds
High-tc films
Laser deposition
Laser-solid interaction
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
PLD
Superconducting films and low-dimensional structures
Superconductivity
Thin films
Y-based cuprates
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Summary:Pulsed laser-assisted deposition (PLD) has recently emerged as a most promising film growth technique, at least for basic research, as this has been best demonstrated for highTc superconducting oxides and YBa2Cu3O7−x in particular. This article briefly outlines the specific features of this technique and its potential, illustrated by the example of the growth of YBa2Cu3O7−x thin films aimed at the preparation of microwave passive devices. The perspectives of development of PLD and its ability to become an industrial process are discussed.
ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(95)00535-8