Influence of the deposition gas on the properties of plasma-deposited carbonized layers

Hard amorphous hydrocarbon films have been deposited by r.f. glow discharges in pure methane as well as methane-hydrogen and methane-helium mixtures. Helium or hydrogen addition at constant partial pressure of methane results in an increase of the growth rate in comparison with pure methane. Whereas...

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Bibliographic Details
Published in:Surface & coatings technology 1991-05, Vol.45 (1), p.353-358
Main Authors: Boutard, D., Mo¨ller, W.
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Ion and electron beam-assisted deposition
ion plating
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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Summary:Hard amorphous hydrocarbon films have been deposited by r.f. glow discharges in pure methane as well as methane-hydrogen and methane-helium mixtures. Helium or hydrogen addition at constant partial pressure of methane results in an increase of the growth rate in comparison with pure methane. Whereas helium is not incorporated into the film, an additional hydrogen uptake is found for hydrogen dilution. Both the film density and the index of refraction can be varied by the use of different gas mixtures. The results are explained qualitatively in terms of ballistic effects resulting from ion bombardment during film growth.
ISSN:0257-8972
1879-3347
DOI:10.1016/0257-8972(91)90242-O