H + processing of Ni/Al multilayer structures

• Published in: Surface & coatings technology 1996-09, Vol.83 (1), p.45-48
• Main Authors: Mozetič, M., Zalar, A., Arčon, I., Praček, B., Drobnič, M., Panjan, P.
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Depth profile; Exact sciences and technology; Hydrogen plasma; Multilayer structure; Nickel aluminide; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/0257-8972(95)02784-X

The method of heat transfer in low pressure weakly ionized hydrogen plasma was used for the thermal processing of samples of an Ni/Al multilayer structure on well polished silicon substrates. The samples were exposed to hydrogen plasma under different conditions. The sample temperature increased typically at a rate of 10 °C s −1, remained constant for several minutes, and decreased at a rate of 10 °C s −1. The steady temperature was between 300 °C and 1000 °C. The samples were analyzed using Auger electron spectroscopy and extended X-ray absorption fine structure spectroscopy. The results show that the coating obtained after thermal processing is a mixture of nickel, aluminum and nickel aluminides, different from NiAl binary alloy. At high temperatures, evaporation of aluminum from the coating was observed.