Gigatron ® — a new source for low-pressure plasmas

A linearly extended microwave plasma source was developed that is used in the pressure range below 1 kPa. In the Gigatron ® device, the microwaves (f=2.45 GHz) are coupled into the vacuum chamber in the form of a coaxial waveguide, consisting of an inner copper rod and a surrounding quartz tube with...

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Bibliographic Details
Published in:Surface & coatings technology 1995-09, Vol.74 (1-3), p.200-205
Main Authors: Petasch, W., Räuchle, E., Weichart, J., Bickmann, H.
Format: Article
Language:English
Subjects:
Etching
Exact sciences and technology
Low pressure plasma
Microwaves
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma production and heating
Plasma sources
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Summary:A linearly extended microwave plasma source was developed that is used in the pressure range below 1 kPa. In the Gigatron ® device, the microwaves (f=2.45 GHz) are coupled into the vacuum chamber in the form of a coaxial waveguide, consisting of an inner copper rod and a surrounding quartz tube with atmospheric pressure between them. The plasma is produced outside the quartz tube and forms the outer conductor of a coaxial waveguide. The homogeneity and the extension of the plasma were investigated with respect to process parameters as a function on the radial and axial distances from the plasma source. It is shown that the plasma can be extended to a length of more than 1 m for an applied microwave power of 1.2 kW.
ISSN:0257-8972
1879-3347
DOI:10.1016/0257-8972(95)08229-8