Observation of phase contrast in covergent-beam electron diffraction patterns

A conventional transmission electron microscope equipped with a cold field emission source (Hitachi HF-2000) was used to record coherent phase contrast from the overlap regions of convergent-beam electron diffraction (CBED) patterns in 6H SiC. The focused probe size (∼ nm) was smaller than the plana...

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Bibliographic Details
Published in:Ultramicroscopy 1992, Vol.41 (4), p.423-428
Main Authors: Vine, W.J., Vincent, R., Spellward, P., Steeds, J.W.
Format: Article
Language:English
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Summary:A conventional transmission electron microscope equipped with a cold field emission source (Hitachi HF-2000) was used to record coherent phase contrast from the overlap regions of convergent-beam electron diffraction (CBED) patterns in 6H SiC. The focused probe size (∼ nm) was smaller than the planar spacing allong the c axis (1.5 nm). When a probe was slightly defocused to illuminate several units cells, the overlaps between adjacent CBED discs showed parallel sets of fringes, with relative shifts that were consistent with the phasing of the SiC structure factors.
ISSN:0304-3991
1879-2723
DOI:10.1016/0304-3991(92)90222-6