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A new approach for thin film InP solar cells
The use of an InP thin film solar cell on an Si substrate is proposed; its qualities of high efficiency and high radiation resistance are important in minimizing cost and weight. The advantages of InP over GaAs and Si as a thin film solar cell material are discussed. The photovoltaic properties of t...
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Published in: | Solar cells 1986-11, Vol.19 (1), p.85-96 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The use of an InP thin film solar cell on an Si substrate is proposed; its qualities of high efficiency and high radiation resistance are important in minimizing cost and weight. The advantages of InP over GaAs and Si as a thin film solar cell material are discussed. The photovoltaic properties of the InP thin film solar cell are calculated by considering the dislocation effect upon the minority-carrier diffusion length in the thin film. It is estimated that one can fabricate InP thin film solar cells on Si substrates, with an efficiency of 18% or more, if the dislocation density in the InP film is less than 10
6 cm
−2. |
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ISSN: | 0379-6787 1878-2655 |
DOI: | 10.1016/0379-6787(86)90052-9 |