Structural and morphological studies of electrodeposited amorphous silicon thin films

• Published in: Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 1992-12, Vol.15 (3), p.237-243
• Main Authors: Sarma, P.R.L., Mohan, T.R.Rama, Venkatachalam, S., Singh, Jagmal, Sundersingh, V.P.
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Surface and interface dynamics and vibrations; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology
• ISSN: 0921-5107; 1873-4944
• DOI: 10.1016/0921-5107(92)90064-G

Amorphous silicon thin films obtained from hydrofluosilicic acid using the electrodeposition method are analysed for structure and morphology. The chemical nature of the films is discussed using the data from IR spectroscopy. The electrical resistivity of these films is very high, of the order of 10 12–10 13 Ω cm, under the present experimental conditions. X-ray diffraction spectra revealed that the films are not crystalline in nature. At low concentrations of the electrolyte, scanning electron microscopy photographs exhibited some microstructure with crystalline order of about 100 Å. At high concentrations, the structure of the films changed widely to be homogenous.