Electrical resistance of copper phthalocyanine thin films as influenced by substrates, electrodes and physical features of the films

The influence of several features upon the electrical resistance of gas-sensitive copper phthalocyanine (CuPc) thin films has been investigated. The main factors studied concern the substrate nature (Al 2O 3 or Si/SiO 2), electrode layout, film thickness and deposition rate. Subsequent annealing rou...

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Bibliographic Details
Published in:Sensors and actuators. B, Chemical Chemical, 1996-01, Vol.30 (2), p.143-150
Main Authors: de Haan, A., Decroly, A.
Format: Article
Language:English
Subjects:
Analytical chemistry
Chemistry
Copper phthalocyanine
Electrical resistance
Exact sciences and technology
Gas sensors
General, instrumentation
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Summary:The influence of several features upon the electrical resistance of gas-sensitive copper phthalocyanine (CuPc) thin films has been investigated. The main factors studied concern the substrate nature (Al 2O 3 or Si/SiO 2), electrode layout, film thickness and deposition rate. Subsequent annealing round 200°C may induce more or less deep structural changes subject to the type of substrate. Molecular deterioration may also occur by way of electrochemical processes under some conditions. The effect of humidity on the electricla resistance also appears to be substrate dependent.
ISSN:0925-4005
1873-3077
DOI:10.1016/0925-4005(95)01790-9