Sodium microsensors based on ISFET/REFET prepared through an ion-implantation process fully compatible with a standard silicon technology

Characteristics of Na-ISFET and REFET microsensors produced by a mild ion-implantation technique are investigated in order to design a selective sodium-ion microsensor operating in a differential mode. By implanting a fluence of 2 × 10 16 ions cm −2 of Al + at 10 keV and Na + at 7 keV into the Na-IS...

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Bibliographic Details
Published in:Sensors and actuators. B, Chemical Chemical, 1996-05, Vol.32 (2), p.101-105
Main Authors: Baccar, Z.M., Jaffrezic-Renault, N., Martelet, C., Jaffrezic, H., Marest, G., Plantier, A.
Format: Article
Language:English
Subjects:
Analytical chemistry
Chemistry
Electrochemical sensors
Electrochemistry
Electrodes: preparations and properties
Exact sciences and technology
General and physical chemistry
General, instrumentation
Ion implantation
Ion selective electrodes
Na +-ISFET/REFET
Sensitivity
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Summary:Characteristics of Na-ISFET and REFET microsensors produced by a mild ion-implantation technique are investigated in order to design a selective sodium-ion microsensor operating in a differential mode. By implanting a fluence of 2 × 10 16 ions cm −2 of Al + at 10 keV and Na + at 7 keV into the Na-ISFET and a fluence of 10 14 ions cm −2 of Al + and of Na + at the same energies for the REFET, the potassium interference can be minimized and a signal of 58 mV pNa −1 in the range 10 −4 to 10 −1 M can be obtained in the differential mode, with a detection limit of about 10 −7 M.
ISSN:0925-4005
1873-3077
DOI:10.1016/0925-4005(96)80117-1