Thermal expansion behavior of NiSi/NiSi2

The thermal expansion of NiSi/NiSi2 for a range of temperatures from 293 to 1223 K was determined using high-temperature X-ray diffraction. While a linear relation with temperature was found for the lattice parameter of NiSi2, third-order relationships were found for the three lattice parameters of...

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Bibliographic Details
Published in:Scripta metallurgica et materialia 1992-01, Vol.26 (1), p.85-88
Main Authors: Wilson, D. F., Cavin, O. B.
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Nonmetallic Materials
Physics
Thermal expansion
thermomechanical effects and density
Thermal properties of condensed matter
Thermal properties of crystalline solids
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Summary:The thermal expansion of NiSi/NiSi2 for a range of temperatures from 293 to 1223 K was determined using high-temperature X-ray diffraction. While a linear relation with temperature was found for the lattice parameter of NiSi2, third-order relationships were found for the three lattice parameters of NiSi, with one of the parameters showing a decrease with increasing temperature. The volumetric expansion of both materials exhibited linear relationships.
ISSN:0956-716X
DOI:10.1016/0956-716X(92)90374-N