Photothermal Investigation of Ti-Cu-N and Ti-Ni-N PVD Films

Thin titanium based PVD films on steel substrates are promising material combinations for high quality moulding tools required for the manufacturing of complex optical components. The chemical film composition and PVD process parameters determine the thermal and mechanical layer properties, which mu...

Full description

Saved in:
Bibliographic Details
Published in:CIRP annals 2006, Vol.55 (1), p.585-588
Main Authors: Prekel, H., Klopfstein, M.J., Giesselbach, M., Patzelt, S., Ghisleni, R., Lucca, D.A., Goch, G., Stock, H.-R.
Format: Article
Language:English
Subjects:
Coating
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mechanical and acoustical properties
Photothermal radiometry
Physical properties of thin films, nonelectronic
Physical Vapour Deposition (PVD)
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Thin titanium based PVD films on steel substrates are promising material combinations for high quality moulding tools required for the manufacturing of complex optical components. The chemical film composition and PVD process parameters determine the thermal and mechanical layer properties, which must remain stable at high temperatures during the moulding process. This paper describes the investigation of thermal and mechanical film properties with respect to film composition and thermal treatment at temperatures typical for moulding processes.
ISSN:0007-8506
DOI:10.1016/S0007-8506(07)60488-0