Heat pulse propagation in Si substrates after YBCO laser ablation

The propagation of heat pulses produced in thin silicon wafers by photoexcitation is investigated before and after the YBCO laser ablation. The Monte-Carlo simulation and analysis of the heat pulse shape led to conclusion about the introducing into the Si substrate of the acceptor type additional ce...

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Bibliographic Details
Published in:Cryogenics (Guildford) 1994, Vol.34, p.855-858
Main Authors: Bonch-Osmolovskii, M.M., Galkina, T.I., Klokov, A.Yu, Onishchenko, E.E., Sharkov, A.I.
Format: Article
Language:English
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Summary:The propagation of heat pulses produced in thin silicon wafers by photoexcitation is investigated before and after the YBCO laser ablation. The Monte-Carlo simulation and analysis of the heat pulse shape led to conclusion about the introducing into the Si substrate of the acceptor type additional centers in the process of laser ablation. These centers turn to be phonon scatterers and therefore change the heat transfer velocity.
ISSN:0011-2275
1879-2235
DOI:10.1016/S0011-2275(05)80201-2