Highly selective growth of AlGaInAs assisted by CBr4 during MOCVD growth

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Bibliographic Details
Published in:Journal of crystal growth 2000-12, Vol.221 (1-4), p.183-188
Main Authors: ARAKAWA, S, ITOH, M, KASUKAWA, A
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(00)00683-7