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Accuracy of differential method to distinguish crystal originated particles from light point defects in Czochralski-grown silicon wafers
To distinguish crystal-originated particles (COPs) from light point defects (LPDs) in Czochralski-grown silicon (Si) wafers, we developed a differential method and studied its performance. To distinguish COPs from LPDs, we compared the difference in LPD properties before and after SC-1 cleaning. COP...
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Published in: | Journal of crystal growth 2000-03, Vol.210 (1), p.31-35 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | To distinguish crystal-originated particles (COPs) from light point defects (LPDs) in Czochralski-grown silicon (Si) wafers, we developed a differential method and studied its performance. To distinguish COPs from LPDs, we compared the difference in LPD properties before and after SC-1 cleaning. COP is defined as an LPD whose location does not change and becomes large in size after SC-1 cleaning. COPs obtained by the differential method were directly observed by atomic force microscopy (AFM) and the accuracy of counting COPs was estimated. Under optimum conditions, COP detection exceeded 75%, making the differential method useful for the estimation of COPs in CZ-Si wafers. |
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ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/S0022-0248(99)00641-7 |