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Characterization and growth of ZnSTe epilayers by hot-wall epitaxy

ZnS 1− x Te x epilayers were grown on GaAs(1 0 0) substrates by hot-wall epitaxy in a wide range of Te composition. The Te composition was determined by Rutherford backscattering spectrometry and the lattice constant was measured by double-crystal rocking curve. It was found that the lattice of the...

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Bibliographic Details
Published in:Journal of crystal growth 2000-03, Vol.210 (4), p.521-526
Main Authors: Yu, Y.-M, Nam, S, Rhee, J.-K, O, Byungsung, Lee, K.-S, Choi, Y.D
Format: Article
Language:English
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Summary:ZnS 1− x Te x epilayers were grown on GaAs(1 0 0) substrates by hot-wall epitaxy in a wide range of Te composition. The Te composition was determined by Rutherford backscattering spectrometry and the lattice constant was measured by double-crystal rocking curve. It was found that the lattice of the epilayer matches well with that of the substrate at x=0.37 as expected by Vegard's rule, and the energy gap was also determined as a function of Te composition by spectrophotometer. It showed that a quadratic relation with the composition: E g( x)=3.71−5.27 x+3.83 x 2. Photoluminescence characteristics were also studied.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(99)00738-1