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Study of the deep-states density by time-resolved transient photocurrent measurements
The post-transit photocurrent analysis has been used to study the density of states (DOS) in the gap of intrinsic and p-doped amorphous silicon. The DOS deduced from the current transients measured at various temperatures shows an unexpected time dependance, which suggests a deviation of the transpo...
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Published in: | Journal of non-crystalline solids 1992, Vol.141 (1-3), p.155-161 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The post-transit photocurrent analysis has been used to study the density of states (DOS) in the gap of intrinsic and p-doped amorphous silicon. The DOS deduced from the current transients measured at various temperatures shows an unexpected time dependance, which suggests a deviation of the transport mechanism from the trap-limited band transport model. To explain this deviation, a new model is proposed which takes account of deep retrapping and/or a change of the release process from the original one to direct hopping-assisted release from deep states to an intermediate energy level. Low-temperature drift mobility data for the hole transport are also presented and they are discussed with respect to the phonon-assisted hopping mechanism. |
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ISSN: | 0022-3093 1873-4812 |
DOI: | 10.1016/S0022-3093(05)80529-0 |