High power generators for medium frequency sputtering applications

• Published in: Journal of non-crystalline solids 1997-09, Vol.218, p.50-53
• Main Authors: Rettich, T., Wiedemuth, P.
• Format: Article
• Language: English
• ISSN: 0022-3093; 1873-4812
• DOI: 10.1016/S0022-3093(97)00131-2

By using a sine-wave generator with a dual magnetron system (DMS), successful reactive sputtering of insulating thin films is possible at power levels of 100 kW and above. Results obtained from laboratory experiments and several installations in flat glass coating production lines shows the advantages of this new process. The requirement for 3.6 m long dual cathodes has led to the development of generators with power levels to 100 kW for continuous operation. Such systems have now been proven in actual production lines, over many weeks, under industrial conditions. Typical operating frequencies of the generators range from 20 to 80 kHz depending on the target materials and the process conditions. With this new technique materials such as SiO 2, TiO 2, SnO 2 and Al 2O 3 have been sputtered with great success. The following paper describes the system design of a medium frequency generator and the experimental results achieved with dual magnetron sputter systems operating at power levels up to 130 kW in metallic and reactive sputter mode.