Interaction of H+/H0 with O atoms in thin SiO2 films : a first-principles quantum mechanical study

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Bibliographic Details
Main Authors: KARNA, S. P, PUGH, R. D, SHEDD, W. M, SINGARAJU, B. B. K
Format: Conference Proceeding
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Crystal binding
cohesive energy
Crystalline state (including molecular motions in solids)
Exact sciences and technology
Physics
Structure and morphology
thickness
Structure of solids and liquids
crystallography
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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ISSN:0022-3093
1873-4812
DOI:10.1016/S0022-3093(99)00375-0