Plasma deposited boronized carbon films

A new method of plasma deposition of boron-carbon films is described. Since the precursors used the vapours of safe, solid carboranes, there is no neccessity for special safety precautions. The analysis of films showed that they are amorphous hydrogenated films α-B/C:H with ratio B/C = 2 and more.

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Bibliographic Details
Published in:Journal of nuclear materials 1992, Vol.191, p.508-511
Main Authors: Sharapov, V.M., Kanaev, A.I., Zakharov, A.P., Gorodetsky, A.E.
Format: Article
Language:English
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Description
Summary:A new method of plasma deposition of boron-carbon films is described. Since the precursors used the vapours of safe, solid carboranes, there is no neccessity for special safety precautions. The analysis of films showed that they are amorphous hydrogenated films α-B/C:H with ratio B/C = 2 and more.
ISSN:0022-3115
1873-4820
DOI:10.1016/S0022-3115(09)80097-4