Blazed diffraction gratings fabricated using X-ray lithography: fabrication, modeling and simulation

Diffraction gratings are used in optical communications devices, spectrographs, optical scanners, monochromators, and in other instances. Diffraction gratings are either transmission or reflection. Reflective gratings are, usually, either ruled or holographic. Blazed gratings (step-echelette or phas...

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Bibliographic Details
Published in:Microelectronics and reliability 2003-02, Vol.43 (2), p.249-258
Main Author: Hagouel, Paul Isaac
Format: Article
Language:English
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Summary:Diffraction gratings are used in optical communications devices, spectrographs, optical scanners, monochromators, and in other instances. Diffraction gratings are either transmission or reflection. Reflective gratings are, usually, either ruled or holographic. Blazed gratings (step-echelette or phase gratings) are non-planar gratings. We present the fabrication of blazed diffraction gratings using X-ray lithography. We model, theoretically, the development process of X-ray exposed X-ray sensitive resist material (polymethyl methacrylate), and we establish a simulation algorithm, the ray-tracing algorithm based on the Hamilton–Jacobi equation. Theoretical predictions based on simulation results validate fully the fabricational results.
ISSN:0026-2714
1872-941X
DOI:10.1016/S0026-2714(02)00265-2