Molecular surface structure of poly(3-hexylthiophene) studied by low energy ion scattering

Low energy ion scattering and X-ray photoelectron spectroscopy were used to study the surface of thin spin-coated poly(3-hexylthiophene) (P3HT) films on silica. We found that the composition of the outermost surface differs from that of the bulk due to the surface molecular structure: the sulphur at...

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Bibliographic Details
Published in:Surface science 2002-07, Vol.512 (3), p.194-200
Main Authors: Ponjée, M.W.G, Reijme, M.A, Langeveld-Voss, B.M.W, Denier van der Gon, A.W, Brongersma, H.H
Format: Article
Language:English
Subjects:
Amorphous surfaces
Aromatics
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Low energy ion scattering (LEIS)
Physics
Solid surfaces and solid-solid interfaces
Sputtering
Surface segregation
Surface structure and topography
Surface structure, morphology, roughness, and topography
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:Low energy ion scattering and X-ray photoelectron spectroscopy were used to study the surface of thin spin-coated poly(3-hexylthiophene) (P3HT) films on silica. We found that the composition of the outermost surface differs from that of the bulk due to the surface molecular structure: the sulphur atoms are screened from being at the outermost surface, presumably by the hexyl side-chains. The influence of this intramolecular segregation phenomenon on the composition is limited to the outermost surface. Comparison of the sputter-profile of P3HT with that taken on a polycrystalline α-quaterthiophene film shows that after sputtering the sulphur to carbon atomic ratio of bulk P3HT is observed.
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(02)01508-X