The influence of enhanced nucleation on thin-film growth

We have used kinetic Monte Carlo simulations to study the influence of enhanced nucleation on the growth of epitaxial thin films. Enhanced nucleation was achieved by depositing four-atom clusters in addition to single atoms. The influence of this additional process on the island density, the island...

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Bibliographic Details
Published in:Surface science 1997, Vol.370 (1), p.L193-L200
Main Authors: Breeman, M., Michely, Th, Comsa, G.
Format: Article
Language:English
Subjects:
Atomistic dynamics
Computer simulations
Cross-disciplinary physics: materials science
rheology
Epitaxy
Exact sciences and technology
Growth
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Nucleation
Physics
Surface roughening
Surface structure, morphology, roughness, and topography
Vapor phase epitaxy
growth from vapor phase
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Summary:We have used kinetic Monte Carlo simulations to study the influence of enhanced nucleation on the growth of epitaxial thin films. Enhanced nucleation was achieved by depositing four-atom clusters in addition to single atoms. The influence of this additional process on the island density, the island size distribution and the surface morphology are investigated as a function of the height of the Ehrlich-Schwoebel barrier for interlayer diffusion.
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(96)01130-2